Universidad de Zaragoza Repository

Curso: 2017-2018

Universidad de Zaragoza, Zaragoza

Titulación: Máster Universitario en Materiales Nanoestructurados para Aplicaciones Nanotecnológicas

Idioma: Español

Profesor(es): PILAR CEA, MINGUEZA ; Rosa María Córdoba, Castillo ; JOSÉ MARÍA DE TERESA, NOGUERAS ; IGNACIO GASCÓN, SABATÉ ; ANA ISABEL GRACIA, LOSTAO ; NOELIA MARCANO, AGUADO ; SANTIAGO MARTÍN, SOLANS ; JOSÉ ANGEL PARDO, GRACIA ; SORAYA SANGIAO, BARRAL

Resumen: Breve presentación de la asignatura LA ASIGNATURA SE IMPARTE EN INGLES Y LA GUIA DOCENTE SE PROPORCIONA SOLO EN ESE IDIOMA. THIS MODULE IS TAUGHT IN ENGLISH. INFORMATION IS ONLY AVAILABLE IN THIS LANGUAGE. PLEASE, GO TO THE ENGLISH VERSION.

Abstract: Brief presentation of the course The two types of approach used for the production of nanostructured materials are presented in this subject, i.e. the "top-down" method which consists of "sculpting" a macro or micro material until obtaining the nanoscopic dimensions required, and the "bottom-up" method in which the atoms and molecules are moved like "bricks" to create a nanoscopic molecular building. A brief description of the contents of this subject includes: Presentation of the nanostructured materials preparation methods: "top-down" and "bottom-up" approaches. Preparation methods for thin film, single and multi-layer molecules: chemical vapour deposition (CVD), physical vapour deposition (PVD), liquid phase deposition (“cast films”, “spin coating”, “spray coating”, “ink printing”, “dip-coating”, “layer-by-layer”, Langmuir-Blodgett, liquid phase epitaxy, electroplating, etc.), solid phase deposition (“powder deposition”, “screen printing”). Clean Rooms. Optical lithography. Electron beam lithography. Ion beam lithography. Nanoimprint lithography and the different Scanning Probe Lithographies.  The lectures are complemented by four practical sessions including: 1.- Liquid phase deposition techniques 2.- Optical lithography 3.- PLD Sputtering 4.- Dual Beam lithography (NanoLab)

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