<?xml version="1.0" encoding="UTF-8"?>
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<dc:dc xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:invenio="http://invenio-software.org/elements/1.0" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd"><dc:identifier>doi:10.1039/d0cp04878j</dc:identifier><dc:language>eng</dc:language><dc:creator>Cuartero, V.</dc:creator><dc:creator>Monteseguro, V.</dc:creator><dc:creator>Otero-De-La-Roza, A.</dc:creator><dc:creator>El Idrissi, M.</dc:creator><dc:creator>Mathon, O.</dc:creator><dc:creator>Shinmei, T.</dc:creator><dc:creator>Irifune, T.</dc:creator><dc:creator>Sanson, A.</dc:creator><dc:title>Interplay between local structure, vibrational and electronic properties on CuO under pressure</dc:title><dc:identifier>ART-2020-121251</dc:identifier><dc:description>The electronic and local structural properties of CuO under pressure have been investigated by means of X-ray absorption spectroscopy (XAS) at Cu K edge and ab initio calculations, up to 17 GPa. The crystal structure of CuO consists of Cu motifs within CuO4 square planar units and two elongated apical Cu-O bonds. The CuO4 square planar units are stable in the studied pressure range, with Cu-O distances that are approximately constant up to 5 GPa, and then decrease slightly up to 17 GPa. In contrast, the elongated Cu-O apical distances decrease continuously with pressure in the studied range. An anomalous increase of the mean square relative displacement (EXAFS Debye-Waller, s2) of the elongated Cu-O path is observed from 5 GPa up to 13 GPa, when a drastic reduction takes place in s2. This is interpreted in terms of local dynamic disorder along the apical Cu-O path. At higher pressures (P &gt; 13 GPa), the local structure of Cu2+ changes from a 4-fold square planar to a 4+2 Jahn-Teller distorted octahedral ion. We interpret these results in terms of the tendency of the Cu2+ ion to form favorable interactions with the apical O atoms. Also, the decrease in Cu-O apical distance caused by compression softens the normal mode associated with the out-of-plane Cu movement. CuO is predicted to have an anomalous rise in permittivity with pressure as well as modest piezoelectricity in the 5-13 GPa pressure range. In addition, the near edge features in our XAS experiment show a discontinuity and a change of tendency at 5 GPa. For P &lt; 5 GPa the evolution of the edge shoulder is ascribed to purely electronic effects which also affect the charge transfer integral. This is linked to a charge migration from the Cu to O, but also to an increase of the energy band gap, which show a change of tendency occurring also at 5 GPa.</dc:description><dc:date>2020</dc:date><dc:source>http://zaguan.unizar.es/record/108336</dc:source><dc:doi>10.1039/d0cp04878j</dc:doi><dc:identifier>http://zaguan.unizar.es/record/108336</dc:identifier><dc:identifier>oai:zaguan.unizar.es:108336</dc:identifier><dc:relation>info:eu-repo/grantAgreement/ES/MICINN/FJCI-2016-27921</dc:relation><dc:relation>info:eu-repo/grantAgreement/ES/MICINN/PGC2018-097520-A-100</dc:relation><dc:relation>info:eu-repo/grantAgreement/ES/MICINN/RyC-2016-20301</dc:relation><dc:relation>info:eu-repo/grantAgreement/ES/MINECO/RED2018-102612-T</dc:relation><dc:identifier.citation>Physical chemistry chemical physics 22, 42 (2020), 24299-24309</dc:identifier.citation><dc:rights>All rights reserved</dc:rights><dc:rights>http://www.europeana.eu/rights/rr-f/</dc:rights><dc:rights>info:eu-repo/semantics/openAccess</dc:rights></dc:dc>

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