doi:10.1039/d1na00580dengSalvador-Porroche A.Sangiao S.Magén C.Barrado M.Philipp P.Belotcerkovtceva D.Kamalakar M.V.Cea P.Teresa J.M. deHighly-efficient growth of cobalt nanostructures using focused ion beam induced deposition under cryogenic conditions: Application to electrical contacts on graphene, magnetism and hard maskingART-2021-124952Emergent technologies are required in the field of nanoelectronics for improved contacts and interconnects at nano and micro-scale. In this work, we report a highly-efficient nanolithography process for the growth of cobalt nanostructures requiring an ultra-low charge dose (15 µC cm-2, unprecedented in single-step charge-based nanopatterning). This resist-free process consists in the condensation of a ~28 nm-thick Co2(CO)8 layer on a substrate held at -100 °C, its irradiation with a Ga+ focused ion beam, and substrate heating up to room temperature. The resulting cobalt-based deposits exhibit sub-100 nm lateral resolution, display metallic behaviour (room-temperature resistivity of 200 µO cm), present ferromagnetic properties (magnetization at room temperature of 400 emu cm-3) and can be grown in large areas. To put these results in perspective, similar properties can be achieved by room-temperature focused ion beam induced deposition and the same precursor only if a 2 × 103 times higher charge dose is used. We demonstrate the application of such an ultra-fast growth process to directly create electrical contacts onto graphene ribbons, opening the route for a broad application of this technology to any 2D material. In addition, the application of these cryo-deposits for hard masking is demonstrated, confirming its structural functionality. This journal is © The Royal Society of Chemistry.2021http://zaguan.unizar.es/record/10837810.1039/d1na00580dhttp://zaguan.unizar.es/record/108378oai:zaguan.unizar.es:108378info:eu-repo/grantAgreement/EUR/COST/CA19140 FIT4NANOinfo:eu-repo/grantAgreement/ES/CSIC/PIE-202060E187info:eu-repo/grantAgreement/ES/CSIC/PTI-001info:eu-repo/grantAgreement/ES/DGA/E31-20Rinfo:eu-repo/grantAgreement/ES/MCIU/MAT2017-82970-C2-2-Rinfo:eu-repo/grantAgreement/ES/MCIU/PID2019-105881RB-I00info:eu-repo/grantAgreement/ES/MCIU/PID2020-112914RB-I00info:eu-repo/grantAgreement/ES/MINECO/MAT2018-102627-TNanoscale Advances 3, 19 (2021), 5656-5662byhttp://creativecommons.org/licenses/by/3.0/es/info:eu-repo/semantics/openAccess