110769 20220223124039.0 doi 10.1109/DTIP.2016.7514895 sideral 125584 ART-2016-125584 eng Berenschot, J.W. 3D-Fractal engineering based on oxide-only corner lithography 2016 This paper reports a new highly simplified machining process for three dimensional (3D)-fractal nanofabrication based on oxide-only corner lithography. It consists of a repeated sequence of wet etching (silicon), thermal oxidation and wet etching (silicon oxide). The previously reported 3D-fractal fabrication process needed additional low pressure chemical vapor deposition (LPCVD) steps of silicon nitride, as well as local oxidation of silicon (LOCOS). Employing this new procedure, a three generation folded silicon oxide fractal sheet with approx. a 10 µm footprint has been fabricated. Access copy available to the general public Unrestricted info:eu-repo/semantics/openAccess All rights reserved http://www.europeana.eu/rights/rr-f/ info:eu-repo/semantics/conferenceObject info:eu-repo/semantics/publishedVersion Tiggelaar, R. M. Geerlings, J. Gardeniers, J.G.E. Tas, N.R. Malankowska, M. Universidad de Zaragoza (orcid)0000-0001-9595-0831 Pina, M.P. Universidad de Zaragoza (orcid)0000-0001-9897-6527 Mallada, R. Universidad de Zaragoza (orcid)0000-0002-4758-9380 5005 555 Universidad de Zaragoza Dpto. Ing.Quím.Tecnol.Med.Amb. Área Ingeniería Química (2016), [4 pp.] Symp. Des. Test Integr. Packag. MEMS/MOEMS Symposium on Design, Test, Integration & Packaging of MEMS/MOEMS 2768-1874 2783349 http://zaguan.unizar.es/record/110769/files/texto_completo.pdf Versión publicada 2724961 http://zaguan.unizar.es/record/110769/files/texto_completo.jpg?subformat=icon icon Versión publicada oai:zaguan.unizar.es:110769 articulos driver 2022-02-23-11:08:36 ARTICLE