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<collection>
<dc:dc xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:invenio="http://invenio-software.org/elements/1.0" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd"><dc:identifier>doi:10.1016/j.vacuum.2022.111485</dc:identifier><dc:language>eng</dc:language><dc:creator>Carretero, E.</dc:creator><dc:creator>Cueva, A.</dc:creator><dc:creator>Preciado-Garbayo, J.</dc:creator><dc:creator>Sevillano, P.</dc:creator><dc:title>Improved photoenergy properties of low-emissivity coatings deposited by sputtering with an ion gun treatment</dc:title><dc:identifier>ART-2022-130619</dc:identifier><dc:description>This work studies the effect of ion treatment on low-emissivity (low-e) coatings deposited by magnetron sputtering. Specifically, we have investigated the application of an ion treatment in the dielectric layer before deposition of a layer of silver. This reduces layer roughness which means the silver layer can be deposited with enhanced characteristics. We have also evaluated the etching rate on the SnOx layer due to the ion treatment on already deposit coatings of equal thicknesses. Subsequently, we studied the effects on the coating's photoenergy properties. For equivalent coatings, we found that those treated with ions were more transparent in the visible region, more reflective, and had a lower emissivity, which are essential requirements for low-e coatings applied in architectural glass.</dc:description><dc:date>2022</dc:date><dc:source>http://zaguan.unizar.es/record/119892</dc:source><dc:doi>10.1016/j.vacuum.2022.111485</dc:doi><dc:identifier>http://zaguan.unizar.es/record/119892</dc:identifier><dc:identifier>oai:zaguan.unizar.es:119892</dc:identifier><dc:relation>info:eu-repo/grantAgreement/ES/DGA/T20-20R</dc:relation><dc:relation>info:eu-repo/grantAgreement/ES/MICINN/RTC2019-007368-3</dc:relation><dc:relation>info:eu-repo/grantAgreement/ES/MINECO/CSIC13-4E-1794</dc:relation><dc:identifier.citation>VACUUM 205 (2022), 111485 [8 pp.]</dc:identifier.citation><dc:rights>by</dc:rights><dc:rights>http://creativecommons.org/licenses/by/3.0/es/</dc:rights><dc:rights>info:eu-repo/semantics/openAccess</dc:rights></dc:dc>

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