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  <contributors>
    <authors>
      <author>Frechilla, Alejandro</author>
      <author>Napari, Mari</author>
      <author>Strkalj, Nives</author>
      <author>Barriuso, Eduardo</author>
      <author>Niang, Kham</author>
      <author>Hellenbrand, Markus</author>
      <author>Strichovanec, Pavel</author>
      <author>Simanjuntak, Firman Mangasa</author>
      <author>Antorrena, Guillermo</author>
      <author>Flewitt, Andrew</author>
      <author>Magén, César</author>
      <author>de la Fuente, Germán F.</author>
      <author>MacManus-Driscoll, Judith L.</author>
      <author>Angurel, Luis Alberto</author>
      <author>Pardo, José Ángel</author>
    </authors>
  </contributors>
  <titles>
    <title>Spatially selective crystallization of ferroelectric Hf0.5Zr0.5O2 films induced by sub-nanosecond laser annealing</title>
    <secondary-title/>
  </titles>
  <doi>10.1016/J.APMT.2023.102033</doi>
  <pages/>
  <volume/>
  <number/>
  <dates>
    <year>2024</year>
    <pub-dates>
      <date>2024</date>
    </pub-dates>
  </dates>
  <abstract/>
</record>

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