Repositorio Institucional de Documentos

@article{Szkudlarek:132485,
      author        = "Szkudlarek, Aleksandra and Michalik, Jan M and
                       Serrano-Esparza, Inés and Novácek, Zdenek and Novotná,
                       Veronika and Ozga, Piotr and Kapusta, Czeslaw and De
                       Teresa, José María",
      title         = "{Graphene removal by water-assisted focused
                       electron-beam-induced etching – unveiling the dose and
                       dwell time impact on the etch profile and topographical
                       changes in SiO<sub>2</sub> substrates}",
      year          = "2024",
}