Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO<sub>2</sub> substrates

Szkudlarek, Aleksandra Michalik, Jan M Serrano-Esparza, Inés Novácek, Zdenek Novotná, Veronika Ozga, Piotr Kapusta, Czeslaw De Teresa, José María Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO<sub>2</sub> substrates

Beilstein j. nanotechnol.

10.3762/bjnano.15.18 2024

2024