132485 20260217205509.0 doi 10.3762/bjnano.15.18 sideral 137573 ART-2024-137573 eng Szkudlarek, Aleksandra Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO₂ substrates 2024 Access copy available to the general public Unrestricted Graphene is one of the most extensively studied 2D materials, exhibiting extraordinary mechanical and electronic properties. Although many years have passed since its discovery, manipulating single graphene layers is still challenging using standard resist-based lithography techniques. Recently, it has been shown that it is possible to etch graphene directly in water-assisted processes using the so-called focused electron-beam-induced etching (FEBIE), with a spatial resolution of ten nanometers. Nanopatterning graphene with such a method in one single step and without using a physical mask or resist is a very appealing approach. During the process, on top of graphene nanopatterning, we have found significant morphological changes induced in the SiO2 substrate even at low electron dose values (<8 nC/μm2). We demonstrate that graphene etching and topographical changes in SiO2 substrates can be controlled via electron beam parameters such as dwell time and dose. info:eu-repo/semantics/openAccess by https://creativecommons.org/licenses/by/4.0/deed.es 2.7 2024 MATERIALS SCIENCE, MULTIDISCIPLINARY 272 / 461 = 0.59 2024 Q3 T2 NANOSCIENCE & NANOTECHNOLOGY 103 / 147 = 0.701 2024 Q3 T3 PHYSICS, APPLIED 94 / 187 = 0.503 2024 Q3 T2 0.435 2024 Electrical and Electronic Engineering 2024 Q2 Physics and Astronomy (miscellaneous) 2024 Q2 Nanoscience and Nanotechnology 2024 Q3 Materials Science (miscellaneous) 2024 Q3 4.8 2024 info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion Michalik, Jan M Serrano-Esparza, Inés (orcid)0000-0002-3723-9029 Novácek, Zdenek Novotná, Veronika Ozga, Piotr Kapusta, Czeslaw De Teresa, José María (orcid)0000-0001-9566-0738 15 (2024), 190-198 Beilstein j. nanotechnol. BEILSTEIN JOURNAL OF NANOTECHNOLOGY 2190-4286 5542313 http://zaguan.unizar.es/record/132485/files/texto_completo.pdf Versión publicada 1801879 http://zaguan.unizar.es/record/132485/files/texto_completo.jpg?subformat=icon icon Versión publicada oai:zaguan.unizar.es:132485 articulos driver 2026-02-17-20:24:31 ARTICLE