Szkudlarek, Aleksandra Michalik, Jan M Serrano-Esparza, Inés Novácek, Zdenek Novotná, Veronika Ozga, Piotr Kapusta, Czeslaw De Teresa, José María Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO₂ substrates Beilstein j. nanotechnol. eng 2024

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