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Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO
2
substrates
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Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO
2
substrates
-
Szkudlarek, Aleksandra
et al
- ART-2024-137573
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[1.72 MB]
11 Mar 2024, 10:23
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texto_completo.pdf
[5.29 MB]
11 Mar 2024, 10:23
Versión publicada