Morellón Alquézar Luis Alberto Pardo Gracia José Angel Cea Mingueza Pilar Gracia Lostao Ana Isabel De Teresa Nogueras José María Martín Solans Santiago Lucas del Pozo Irene 2013 A brief introduction to the subject     The two types of approach used for the production of nanostructured materials are presented in this subject, i.e. the "top-down" method which consists of "sculpting" a macro or micro material until obtaining the nanoscopic dimensions required, and the "bottom-up" method in which the atoms and molecules are moved like "bricks" to create a nanoscopic molecular building.   A brief description of the contents of this subject includes:   Presentation of the nanostructured materials preparation methods: "top-down" and "bottom-up" approaches. Preparation methods for thin film, single and multi-layer molecules: chemical vapour deposition (CVD), physical vapour deposition (PVD), liquid phase deposition (“cast films”, “spin coating”, “spray coating”, “ink printing”, “dip-coating”, “layer-by-layer”, Langmuir-Blodgett, liquid phase epitaxy, electroplating, etc.), solid phase deposition (“powder deposition”, “screen printing”). Optical lithography. Electron beam lithography. Ion beam lithography. Evanescent wave lithography. Nanoimprint lithography.   The theory classes are complemented by four practical sessions including:   1.- Liquid phase deposition techniques 2.- Optical lithography 3.- PLD Sputtering 4.- Nanolab   GDOC