95928 20201026143852.0 doi 10.3390/mi10120799 sideral 116320 ART-2019-116320 eng (orcid)0000-0001-9566-0738 De Teresa, J. M. Universidad de Zaragoza Comparison between focused electron/ion beam-induced deposition at room temperature and under cryogenic conditions 2019 Access copy available to the general public Unrestricted In this contribution, we compare the performance of Focused Electron Beam-induced Deposition (FEBID) and Focused Ion Beam-induced Deposition (FIBID) at room temperature and under cryogenic conditions (the prefix "Cryo" is used here for cryogenic). Under cryogenic conditions, the precursor material condensates on the substrate, forming a layer that is several nm thick. Its subsequent exposure to a focused electron or ion beam and posterior heating to 50°C reveals the deposit. Due to the extremely low charge dose required, Cryo-FEBID and Cryo-FIBID are found to excel in terms of growth rate, which is typically a few hundred/thousand times higher than room-temperature deposition. Cryo-FIBID using the W(CO)6 precursor has demonstrated the growth of metallic deposits, with resistivity not far from the corresponding deposits grown at room temperature. This paves the way for its application in circuit edit and the fast and direct growth of micro/nano-electrical contacts with decreased ion damage. The last part of the contribution is dedicated to the comparison of these techniques with other charge-based lithography techniques in terms of the charge dose required and process complexity. The comparison indicates that Cryo-FIBID is very competitive and shows great potential for future lithography developments. info:eu-repo/grantAgreement/ES/DGA/E13-17R info:eu-repo/grantAgreement/ES/DGA-FEDER/Construyendo Europa desde Aragón info:eu-repo/grantAgreement/ES/DGA/FSE info:eu-repo/grantAgreement/ES/DGA/LMP33-18 info:eu-repo/grantAgreement/ES/MINECO/MAT2017-82970-C2-2-R info:eu-repo/grantAgreement/ES/MINECO/MAT2018-102627-T info:eu-repo/semantics/openAccess by http://creativecommons.org/licenses/by/3.0/es/ 2.523 2019 INSTRUMENTS & INSTRUMENTATION 23 / 64 = 0.359 2019 Q2 T2 NANOSCIENCE & NANOTECHNOLOGY 65 / 103 = 0.631 2019 Q3 T2 0.531 2019 Control and Systems Engineering 2019 Q2 Mechanical Engineering 2019 Q2 Electrical and Electronic Engineering 2019 Q2 info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion (orcid)0000-0002-6087-7467 Orús, P. Córdoba, R. Philipp, P. 2003 395 Universidad de Zaragoza Dpto. Física Materia Condensa. Área Física Materia Condensada 10, 12 (2019), 799 [14 pp] Micromachines (Basel) Micromachines 2072-666X 830347 http://zaguan.unizar.es/record/95928/files/texto_completo.pdf Versión publicada 473455 http://zaguan.unizar.es/record/95928/files/texto_completo.jpg?subformat=icon icon Versión publicada oai:zaguan.unizar.es:95928 articulos driver 2020-10-26-13:26:22 ARTICLE