3D-Fractal engineering based on oxide-only corner lithography

Berenschot, J.W. ; Tiggelaar, R. M. ; Geerlings, J. ; Gardeniers, J.G.E. ; Tas, N.R. ; Malankowska, M. (Universidad de Zaragoza) ; Pina, M.P. (Universidad de Zaragoza) ; Mallada, R. (Universidad de Zaragoza)

Resumen: This paper reports a new highly simplified machining process for three dimensional (3D)-fractal nanofabrication based on oxide-only corner lithography. It consists of a repeated sequence of wet etching (silicon), thermal oxidation and wet etching (silicon oxide). The previously reported 3D-fractal fabrication process needed additional low pressure chemical vapor deposition (LPCVD) steps of silicon nitride, as well as local oxidation of silicon (LOCOS). Employing this new procedure, a three generation folded silicon oxide fractal sheet with approx. a 10 µm footprint has been fabricated.

Idioma: Inglés

DOI: 10.1109/DTIP.2016.7514895

Año: 2016

Publicado en: Symposium on Design, Test, Integration & Packaging of MEMS/MOEMS (2016), [4 pp.]
ISSN: 2768-1874

Tipo y forma: Congress (Published version)

Área (Departamento): Área Ingeniería Química (Dpto. Ing.Quím.Tecnol.Med.Amb.)