Effect of Thermal Processing on the Structural and Magnetic Properties of Epitaxial Co2FeGe Films
Resumen: The structure and magnetic properties of epitaxial Heusler alloy films (Co2FeGe) deposited on MgO (100) substrates were investigated. Films of 60 nm thickness were prepared by magnetron co-sputtering at different substrate temperatures (TS), and those deposited at room temperature were later annealed at various temperatures (Ta). X-ray diffraction confirmed (001) [110] Co2FeGe || (001) [100] MgO epitaxial growth. A slight tetragonal distortion of the film cubic structure was found in all samples due to the tensile stress induced by the mismatch of the lattice parameters between Co2FeGe and the substrate. Improved quality of epitaxy and the formation of an atomically ordered L21 structure were observed for films processed at elevated temperatures. The values of magnetization increased with increasing TS and Ta. Ferromagnetic resonance (FMR) studies revealed 45° in-plane rotation of the easy anisotropy axis direction depending on the degree of the tetragonal distortion. The film annealed at Ta = 573 K possesses the minimal FMR linewidth and magnetic damping, while both these parameters increase for another TS and Ta. Overall, this study underscores the crucial role of thermal treatment in optimizing the magnetic properties of Co2FeGe films for potential spintronic and magnonic applications.
Idioma: Inglés
DOI: 10.3390/nano14211745
Año: 2024
Publicado en: Nanomaterials 14, 21 (2024), 1745 [14 pp.]
ISSN: 2079-4991

Financiación: info:eu-repo/grantAgreement/ES/DGA-FEDER E28-23R
Financiación: info:eu-repo/grantAgreement/ES/MICINN-AEI/PID2020-112914RB-100/AEI/10.13039/501100011033
Tipo y forma: Artículo (Versión definitiva)
Área (Departamento): Área Cienc.Mater. Ingen.Metal. (Dpto. Ciencia Tecnol.Mater.Fl.)

Creative Commons Debe reconocer adecuadamente la autoría, proporcionar un enlace a la licencia e indicar si se han realizado cambios. Puede hacerlo de cualquier manera razonable, pero no de una manera que sugiera que tiene el apoyo del licenciador o lo recibe por el uso que hace.


Exportado de SIDERAL (2024-11-22-11:52:27)


Visitas y descargas

Este artículo se encuentra en las siguientes colecciones:
Artículos



 Registro creado el 2024-11-22, última modificación el 2024-11-22


Versión publicada:
 PDF
Valore este documento:

Rate this document:
1
2
3
 
(Sin ninguna reseña)