| TAZ-TFM-2013-034 |
Micropatterned substrate modified with hydrophic coating for dewatering applications
Rodríguez Castro, Leidys Marleyn
Pina Iritia, María Pilar (dir.) ; Urbiztondo Castro, Miguel Ángel (dir.)
Universidad de Zaragoza,
CIEN,
2013
Ingeniería Química y Tecnologías del Medio Ambiente department,
Máster Universitario en Materiales Nanoestructurados para Aplicaciones Nanotecnológicas (Nanostructured Materials for Nanotechnology Applications)
Free keyword(s): a-type zeolite, microfabrication, silicon wafer, photoresin su-8,
Tipo de Trabajo Académico: Trabajo Fin de Master
Notas: This Master's Thesis is part of a line of research that aims to develop microsystems with layers / coatings zeolite as a differentiator. For this purpose it is necessary to integrate synthesis and the growth stage of polycrystalline layers in the classic schemes zeolite microfabrication. More specifically, this paper proposes micro-traps / / micro-water pre-concentrators for gas streams. These devices are particularly important in systems where the chemical analysis of the gas sample conditioning improves quantification / detection. To that end, two routes have been proposed study, both on hydrophilic microporous materials, which differ in the nature of the support microstructured silicon, and photoresin SU8. On the one hand is to study the synthesis and characterization of polycrystalline layers of hydrophilic zeolites A (LTA structure) wafer scale thin layer of SiO three inches in diameter. Therefore it will be necessary to optimize processes prior to planting second growth stage and subsequent removal of the structuring agent to obtain homogeneous coatings with good adhesion to a support with dimensions typically used in current processes cleanroom . Using techniques of structural and morphological (SEM-EDX, XRD) define the most appropriate synthesis conditions for each zeolite structure. In parallel, we will define the designs of the masks (aspect ratio: length of channel / channel characteristic dimension variable) for etching the surface of the microstructures on Si wafers. The microstructured Si substrates are subjected to optimized processes with secondary growth to get an even coating and a suitable adsorbent loading the application sought.
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