Highly-efficient growth of cobalt nanostructures using focused ion beam induced deposition under cryogenic conditions: Application to electrical contacts on graphene, magnetism and hard masking

Salvador-Porroche A. ; Sangiao S. (Universidad de Zaragoza) ; Magén C. (Universidad de Zaragoza) ; Barrado M. ; Philipp P. ; Belotcerkovtceva D. ; Kamalakar M.V. ; Cea P. (Universidad de Zaragoza) ; Teresa J.M. de (Universidad de Zaragoza)

Resumen: Emergent technologies are required in the field of nanoelectronics for improved contacts and interconnects at nano and micro-scale. In this work, we report a highly-efficient nanolithography process for the growth of cobalt nanostructures requiring an ultra-low charge dose (15 µC cm-2, unprecedented in single-step charge-based nanopatterning). This resist-free process consists in the condensation of a ~28 nm-thick Co2(CO)8 layer on a substrate held at -100 °C, its irradiation with a Ga+ focused ion beam, and substrate heating up to room temperature. The resulting cobalt-based deposits exhibit sub-100 nm lateral resolution, display metallic behaviour (room-temperature resistivity of 200 µO cm), present ferromagnetic properties (magnetization at room temperature of 400 emu cm-3) and can be grown in large areas. To put these results in perspective, similar properties can be achieved by room-temperature focused ion beam induced deposition and the same precursor only if a 2 × 103 times higher charge dose is used. We demonstrate the application of such an ultra-fast growth process to directly create electrical contacts onto graphene ribbons, opening the route for a broad application of this technology to any 2D material. In addition, the application of these cryo-deposits for hard masking is demonstrated, confirming its structural functionality. This journal is © The Royal Society of Chemistry.

Idioma: Inglés

DOI: 10.1039/d1na00580d

Año: 2021

Publicado en: Nanoscale Advances 3, 19 (2021), 5656-5662
ISSN: 2516-0230

Factor impacto JCR: 5.598 (2021)

Categ. JCR: CHEMISTRY, MULTIDISCIPLINARY rank: 56 / 180 = 0.311 (2021) - Q2 - T1
Categ. JCR: MATERIALS SCIENCE, MULTIDISCIPLINARY rank: 111 / 345 = 0.322 (2021) - Q2 - T1
Categ. JCR: NANOSCIENCE & NANOTECHNOLOGY rank: 55 / 109 = 0.505 (2021) - Q3 - T2

Factor impacto CITESCORE: 5.7 - Engineering (Q1) - Materials Science (Q1) - Physics and Astronomy (Q1) - Chemical Engineering (Q2)

Factor impacto SCIMAGO: 1.043 - Atomic and Molecular Physics, and Optics (Q1) - Materials Science (miscellaneous) (Q1) - Engineering (miscellaneous) (Q1) - Bioengineering (Q1)

Financiación: info:eu-repo/grantAgreement/EUR/COST/CA19140 FIT4NANO
Financiación: info:eu-repo/grantAgreement/ES/CSIC/PIE-202060E187
Financiación: info:eu-repo/grantAgreement/ES/CSIC/PTI-001
Financiación: info:eu-repo/grantAgreement/ES/DGA/E31-20R
Financiación: info:eu-repo/grantAgreement/ES/MCIU/MAT2017-82970-C2-2-R
Financiación: info:eu-repo/grantAgreement/ES/MCIU/PID2019-105881RB-I00
Financiación: info:eu-repo/grantAgreement/ES/MCIU/PID2020-112914RB-I00
Financiación: info:eu-repo/grantAgreement/ES/MINECO/MAT2018-102627-T

Tipo y forma: Artículo (Versión definitiva)

Área (Departamento): Área Química Física (Dpto. Química Física)
Área (Departamento): Área Física Materia Condensada (Dpto. Física Materia Condensa.)